Compensation defects in annealed undoped liquid encapsulated Czochralski InP
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Effect of Stress on Creation of Defects in Annealed Czochralski Grown Silicon
The effect of stress (exerted by hydrostatic pressure of argon ambient enhanced up to 1.2 GPa) on the creation of oxygen-related defects in annealed Czochralski grown silicon (Cz-Si) was investigated. Concentrations of oxygen interstitials and of dislocations in Cz-Si samples with before-created nucleation centres for oxygen precipitation were markedly lower after pressure treatment at 1120 to ...
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The distribution in liquid-encapsulated-Czochralski (LEC) GaAs:Te wafers of point and complex defects has been investigated together with their influence on the minority-carrier diffusion length L. Three wafers with different Te-doping concentration (2.2X 1017, 4.5X 1017, and 1.5X 1018 cme3) have been studied by means of the electron-beam-induced-current (EBIC) mode of scanning electron microsc...
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